| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drying device capable of securely removing a liquid from a substrate, and to provide a substrate treatment apparatus equipped with the same. SOLUTION: In each of first and second cleaning/drying treatment units SD1 and SD2, a rinse liquid supply nozzle 660 is connected to a degassing module DM through a rinse liquid supply pipe 661a. The degassing module DM is connected to a rinse liquid supply source R2 through a rinse liquid supply pipe 661. The degassing module DM performs a degassing treatment on a rise liquid. The rinse liquid after the degassing treatment is supplied to the rise liquid supply nozzle 660 through the rise liquid supply pipe 661a. During a drying treatment on the substrate W, the rise liquid is supplied onto the substrate W from the rise liquid supply nozzle 660. Consequently, a liquid layer of the rise liquid is formed on the substrate W. COPYRIGHT: (C)2010,JPO&INPIT |
