EXPOSURE APPARATUS, CLEANING METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing generation of poor exposure.

SOLUTION: The exposure apparatus exposes a substrate with exposure light through exposure liquid. The exposure apparatus includes: an optical member which has an emitting surface wherefrom the exposure light is emitted; a first supply port which supplies the exposure liquid; a liquid immersion member which is capable of forming an immersion space so that an optical path of the exposure light that is emitted from the optical member may be filled with the exposure liquid; a second supply port which supplies a cleaning liquid so that it may contact the liquid immersion member; and a preventive apparatus which prevents the cleaning liquid and the optical member from contacting one another.

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