发明名称 VAPOR DEPOSITION DEVICE AND OPERATION DECISION METHOD OF VAPOR DEPOSITION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition device and an operation decision method of the vapor deposition device, capable of reliably stopping the operation of the device when there is a problem in a sealing mechanism. SOLUTION: After supplying a purge gas between a rotary ring and a sealing member, whether the supply pressure of the purge gas is within a reference range is discriminated (step 104). When the supply pressure is within the reference range, and the displacement amount of the sealing member displaced by the supply of the purge gas is within the reference range, the rotary drive of a rotary shaft by a motor is permitted, and the operation of the vapor deposition device is permitted. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009259989(A) 申请公布日期 2009.11.05
申请号 JP20080106298 申请日期 2008.04.16
申请人 NUFLARE TECHNOLOGY INC 发明人 SUZUKI KUNIHIKO
分类号 H01L21/205;C23C16/44 主分类号 H01L21/205
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