发明名称 STAGE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a stage system enabling alleviation of vibration or drift at a high level and positioning accuracy, which are required for a sample stage of a scanning electron microscope used in a field of semiconductor manufacturing. SOLUTION: The sample stage 3 that is the stage system includes: tables (a center table 5 and a top table 6) constrained by a guide means, thereby moving on a stationary element in a constant direction; a positioning control device carrying out positioning control of the tables by controlling movement and stoppage of the tables; first braking mechanisms 30, 32 adding fixed brake by constant frictional force between the tables and the stationary element; and second braking mechanisms 31, 33 driven at stopping of the tables to put brake on the tables. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009259528(A) 申请公布日期 2009.11.05
申请号 JP20080105677 申请日期 2008.04.15
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIBATA NOBUO;KOYAMA MASAHIRO;OGAWA HIRONORI;TSUTSUMI YOSHITSUGU;KOBAYASHI TOSHITAKA;KONUKI KATSUNORI;FUJITA SHINJI;NAKAGAWA SHUICHI;OKABE SATORU
分类号 H01J37/20 主分类号 H01J37/20
代理机构 代理人
主权项
地址