| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a charged-particle beam writing method and a charged-particle beam writing apparatus capable of calculating a distribution of a beam position shift amount due to a charging effect with satisfactory accuracy. <P>SOLUTION: A pattern density distributionρ(x, y) and a dose amount distribution D(x, y) calculated by using the pattern density distributionρ(x, y) are multiplied to calculate an irradiation amount distribution E(x, y) (S104). A fogging electron amount distribution F(x, y,σ) is calculated by using the irradiation amount distribution E(x, y) and a function g(x, y) describing a fogging spread distribution (S106). A charge amount distribution C(x, y) in an irradiation region and a non-irradiation region is calculated by using the irradiation amount distribution E(x, y) and the fogging electron amount distribution F(x, y,σ) (S108). A position shift amount distribution p(x, y) is calculated by using the charge amount distribution C(x, y) and a response function r(x, y) for converting a charge amount into a position shift error (S110). <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
