发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 <p>A beam splitting unit (31) and a reflection mirror (32) are fixed to a lens barrel (12) in a state where a distance between the unit and the mirror is maintained constant.  A laser beam emitted from a light source is guided to the beam splitting unit through an optical fiber (33), and split into a measurement beam and a reference beam by a beam splitter, and a synthesized beam of the measurement beam and the reference beam, which have reciprocated between the beam splitting unit and the reflection mirror in a liquid (Lq), is guided to a light receiving system through the optical fiber.  In the light receiving system, the measurement beam and the reference beam are permitted to interfere with each other, and based on a photoelectric conversion signal of the interfering beam, a change of the optical path length of the measurement beam is measured.  Thus, a change of the refractive index of the liquid can be optically measured.</p>
申请公布号 WO2009133704(A1) 申请公布日期 2009.11.05
申请号 WO2009JP01951 申请日期 2009.04.30
申请人 NIKON CORPORATION;SHIBAZAKI, YUICHI 发明人 SHIBAZAKI, YUICHI
分类号 G03F7/20;H01L21/027;G01N21/45 主分类号 G03F7/20
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