发明名称 MEASUREMENT APPARATUS, MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the slit, a light receiving element 53 mounted on the stage 60 and including at least two light receiving portions which receive the light transmitted through the slit, a storage unit which stores a relationship between an angle epsilon and a distance between a center position of the slit 54 and a position where a intensity of light that the light receiving element 53 receives is maximum, a calculation unit which obtains the angle epsilon, and a stage driving unit 80 which rotates the stage 60 so that the angle epsilon is equal to zero.
申请公布号 US2009274963(A1) 申请公布日期 2009.11.05
申请号 US20090433682 申请日期 2009.04.30
申请人 CANON KABUSHIKI KAISHA 发明人 OHKUBO AKINORI
分类号 G03F7/20;G01B11/26;G03B27/72 主分类号 G03F7/20
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