| 摘要 |
A scanning exposure apparatus (300) includes a first stage (325), a second stage (345), a projection optical system (330), a first measurement unit (20) arranged on the second stage (345), and a controller (350). A measurement mask (10) is arranged on the first stage (325). The first measurement unit (20) includes a light-shielding member having an opening, and measures the intensity of light having passed through the opening in a light intensity distribution formed on the light-shielding member when at least one of the first stage (325) and the second stage (345) is scanned and a measurement pattern of the measurement mask (10) is obliquely illuminated. The controller (350) calculates the defocus amount, while at least one of the first stage (325) and the second stage (345) is scanned, based on a temporal change in the light intensity measured by the first measurement unit (20).
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