| 摘要 |
<P>PROBLEM TO BE SOLVED: To extract edge points by specifying a height (values indicating a distance from a substrate) on a pattern when edges of the pattern are extracted from a CD-SEM image, or to obtain LER values by the extraction or a Fourier spectrum of the LER. <P>SOLUTION: The same sample is previously observed with the AFM and the CD-SEM (601). A size of the LER obtained by specifying a height, an auto-correlation distance of the LER, or an index called the spectrum is obtained from results of the AFM observation. Further, these indices obtained by specifying image processing conditions for detecting the edge points from the CD-SEM observation result are obtained (602). Also, it is determined that heights providing values when the values are matched correspond to the image processing conditions (603) and then, the edge points are extracted from the CD-SEM image instead of the AFM observation by using the image processing conditions. <P>COPYRIGHT: (C)2010,JPO&INPIT |
