发明名称 COPPER PRECURSOR COMPOSITION, AND METHOD OF PREPARING COPPER FILM USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a copper precursor composition that is useful in forming wiring for use in electronics or the like and thermally decomposes at a low temperature, and a method of preparing a copper film using the copper precursor composition. Ž<P>SOLUTION: The copper precursor composition comprising a compound represented by formula (1) (in the formula, X represents formula (2); R<SP>1</SP>, R<SP>2</SP>each independently represent a 1-6C alkyl group that may contain a substituent; and R<SP>3</SP>represents a 4-10C divalent group) and copper formate, thermally decomposes at a low temperature. A copper film can be prepared at a low temperature by using the copper precursor composition. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009256218(A) 申请公布日期 2009.11.05
申请号 JP20080104650 申请日期 2008.04.14
申请人 TORAY IND INC 发明人 KANAMORI ONORI;TAMAKI EIICHIRO;OSETO HIROKI
分类号 C07C215/10;C07C53/06;C07F1/08;C23C18/08;H01L21/288;H01L21/3205;H01L23/52 主分类号 C07C215/10
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