| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method for easily manufacturing a micro phase separation structure film with aligned orientation directions by a large area, and forming a pattern of nanometer scale using the micro phase separation structure film. SOLUTION: The pattern formation method includes processes of: forming a film consisting of a pattern forming material containing block copolymer in which mutually non-soluble polymers of a polymer component (A) containing an aromatic ring, and a polymer component (B) exhibiting liquid crystallinity are coupled by covalent bonding, and the component (A) has etching resistance higher than that of the component (B), on a substrate; and selectively removing a polymer phase exhibiting liquid crystallinity from the micro phase separation structure film formed in the film by ion etching or ordinary pressure plasma. COPYRIGHT: (C)2010,JPO&INPIT |
