| 摘要 |
A plating apparatus with direct electrolyte distribution system, including one or more of the following: an electrolyte tank; an electrolyte distribution compartment within the electrolyte tank, the electrolyte distribution compartment for containing electrolyte, the electrolyte distribution compartment having a first side and a second side; a pump having a fluid connection to the electrolyte distribution compartment for applying pressure to the electrolyte; a plurality of nozzles connected to the first side of the electrolyte distribution compartment, the electrolyte being forced through the plurality of the nozzles from the electrolyte distribution compartment to a part to be plated when the pump applies pressure to the electrolyte in the electrolyte distribution compartment; an electrolyte collection compartment within the electrolyte tank, the electrolyte collection compartment being in fluid communication with the electrolyte distribution compartment; and a removable screen between the electrolyte collection compartment and the second side of the electrolyte distribution compartment. |
