METHOD OF PRODUCING QUARTZ WINDOW AND THERMAL TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a quartz window allowing irradiation of a substrate with light of relatively low energy and a thermal treatment device with the quartz window mounted. SOLUTION: In the thermal treatment device 1, a flash lamp FL is disposed above a chamber 6 and a halogen lamp HL is disposed below the chamber 6. An upper chamber window 63 through which flash light from the flash lamp FL is transmitted into the chamber 6 is produced by performing surface roughening such as sand blasting on the surface of a quartz plate to have a mean surface roughness of 0.1-10 μm and then by dipping the quartz plate in a hydrofluoric acid solution of 3-10 wt.% or less in hydrofluoric acid concentration for eight hours or more. The entire surface of the upper chamber window 63 is made rough and hence the semiconductor wafer W can be irradiated uniformly with the flash light of relatively low energy when flash heating without specifically changing a flash heating part 5. COPYRIGHT: (C)2010,JPO&INPIT