发明名称 MACHINE VISION TECHNIQUE FOR MANUFACTURING SEMICONDUCTOR WAFERS
摘要 A vision system is provided to determine a positional relationship between a photovoltaic device wafer on a platen and a printing element, such as a printing screen, on a remote side of the photovoltaic device wafer from the platen. A source emits ultraviolet light along a path that is transverse to a longitudinal axis of an aperture through the platen, and a diffuser panel is located along that path. A reflector directs the light from the diffuser panel toward the aperture. A video camera is located along the longitudinal axis of the aperture and produces an image using light received from the platen aperture, wherein some of that received light was reflected by the wafer. A band-pass filter is placed in front of the camera to block ambient light. The use of diffused ultraviolet light enhances contrast in the image between the wafer and the printing element.
申请公布号 US2009274361(A1) 申请公布日期 2009.11.05
申请号 US20080113492 申请日期 2008.05.01
申请人 SCHWAB JOHN W;LIU GANG;MICHAEL DAVID J 发明人 SCHWAB JOHN W.;LIU GANG;MICHAEL DAVID J.
分类号 G06K9/00 主分类号 G06K9/00
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