发明名称 |
SUBSTRATE TREATMENT DEVICE, ITS METHOD, AND SUBSTRATE TRANSPORT DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a substrate treatment device capable of sufficiently reducing a transport time of a substrate; its method; and a substrate transport device. Ž<P>SOLUTION: In this substrate treatment device comprising an indexer block and a treatment block, a substrate W is transported between the indexer block and the treatment block by an indexer robot IR. The indexer robot IR is provided with a plurality of hand elements 260 mounted to be vertically arranged. The distance between the hand elements 260 is equal to the distance between substrate housing grooves of a carrier with the substrate W to be carried in the indexer block housed therein. The distance between support plates 51a (and between support plates 52a) vertically adjacent to each other of a substrate mounting part PASS2 arranged between the indexer block and the treatment block is twice as much as the distance between the hand elements 260. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
申请公布号 |
JP2009260252(A) |
申请公布日期 |
2009.11.05 |
申请号 |
JP20080333231 |
申请日期 |
2008.12.26 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
MITSUYOSHI ICHIRO |
分类号 |
H01L21/677;B25J9/04;B25J15/00;B65G49/07;H01L21/304 |
主分类号 |
H01L21/677 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|