发明名称 SUBSTRATE TREATMENT DEVICE, ITS METHOD, AND SUBSTRATE TRANSPORT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide: a substrate treatment device capable of sufficiently reducing a transport time of a substrate; its method; and a substrate transport device. Ž<P>SOLUTION: In this substrate treatment device comprising an indexer block and a treatment block, a substrate W is transported between the indexer block and the treatment block by an indexer robot IR. The indexer robot IR is provided with a plurality of hand elements 260 mounted to be vertically arranged. The distance between the hand elements 260 is equal to the distance between substrate housing grooves of a carrier with the substrate W to be carried in the indexer block housed therein. The distance between support plates 51a (and between support plates 52a) vertically adjacent to each other of a substrate mounting part PASS2 arranged between the indexer block and the treatment block is twice as much as the distance between the hand elements 260. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009260252(A) 申请公布日期 2009.11.05
申请号 JP20080333231 申请日期 2008.12.26
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MITSUYOSHI ICHIRO
分类号 H01L21/677;B25J9/04;B25J15/00;B65G49/07;H01L21/304 主分类号 H01L21/677
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