发明名称 METHOD FOR MANUFACTURING CONTACT PROBE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a contact probe for making a contact section finer than that by a conventional method of stacking a metal layer on a support section. Ž<P>SOLUTION: The contact probe 2 includes the contact section 13 to be brought into contact with an inspecting object, and a beam section 11 for elastically supporting the contact section 13. The method for manufacturing the contact probe includes a contact section formation step of radiating an ion beam containing ions of conductive metal to the beam section 11 in an atmosphere containing compound gas, selectively depositing a part of compound gas to a proximity of an irradiation region of the ion beam on the beam section 11, and forming the contact section 13. In the contact section formation step, the ion beam is applied two-dimensionally for scanning on the beam section 11, and the part of compound gas is deposited while narrowing the scanning range of the ion beam with increase in height of the deposit. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009257934(A) 申请公布日期 2009.11.05
申请号 JP20080107468 申请日期 2008.04.17
申请人 JAPAN ELECTRONIC MATERIALS CORP 发明人 KIMURA TEPPEI
分类号 G01R1/073;G01R1/067;H01L21/66 主分类号 G01R1/073
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