NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

Photoacid generators generate sulfonic acids of formula (1a) or (1b) upon exposure to high-energy radiation. R1-COOCH2CF2SO3-H+ (1a) R1-O-COOCH2CF2SO3-H+ (1b) R1 is a monovalent C20-C50 hydrocarbon group of steroid structure which may contain a heteroatom. The bulky steroid structure ensures adequate control of acid diffusion. The photoacid generators are compatible with resins and suited for use in chemically amplified resist compositions.