VACUUM PROCESSING APPARATUS

摘要

PURPOSE: A vacuum processing device is provided to prevent the plasma from being invaded through a crack between a substrate and a substrate supporting board due to the leakage of electric heat gas. CONSTITUTION: A substrate supporting board is installed within a vacuum chamber to support a substrate. An electrostatic chuck for adsorbing the substrate by the electrostatic force is formed at an upper side of the substrate support board. The substrate support board comprises a plasma invasion preventing part(310). The plasma invasion preventing part is formed along an edge portion of substrate supporting board which supports an edge of the substrate part to prevent the plasma from entering between a lower side of the substrate and an upper side of the substrate supporting board. The plasma invasion preventing part includes at least one of a plurality of projections and one or more concave groove parts.