MULTIPLE GRADATION PHOTOMASK, METHOD OF MANUFACTURING MULTIPLE GRADATION PHOTOMASK, PATTERN TRANSFER METHOD, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To provide a multiple gradation photomask and a pattern transfer method to obtain a resist pattern with a steep profile.

SOLUTION: The multiple gradation photomask arranged on a transparent substrate 11, and includes a transfer pattern having a translucent portion and a semi-translucent portion by respectively pattern-processing a semi-translucent film transmitting exposure light partly. The semi-translucent portion consists of a first semi-translucent film 12 having relatively low phase shift quantity in respect to a transparent substrate, and a second semi-translucent film 13 having relatively high phase shift quantity in respect to the first semi-translucent film 12.

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