| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve shape precision of a light shield film and a translucent film of a bottom-half type multi-gradation photomask, and to improve film constitution. <P>SOLUTION: The multi-gradation photomask is formed on a transparent substrate 11, and includes a transparent portion C which transmits the whole of exposure light, a light shield portion B which blocks the whole of the exposure light, and a translucent portion A which transmits part of the exposure light. Then the light shield portion B is provided over the translucent film, and has patterns 13a and 14a of light shield films of a laminate structure wherein at least two light shield films are laminated. The pattern 14a of the upper-layer light shield film is made of titanium or metal containing titanium, and the pattern 13a of the lower-layer light shield film is made of iron or metal containing iron. The pattern 12a of the translucent film is provided between the transparent substrate 11 and lower-layer light shield film 13a, and the pattern 12a of the translucent film and the pattern 13a of the lower-layer light shield film have portions in contact with each other without interposing any other layer. <P>COPYRIGHT: (C)2010,JPO&INPIT |
