| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method having verification structures that enable to determine the distribution of each of a contrast setting, a dose setting, and a focus setting. <P>SOLUTION: A method of measuring a lithographic projection apparatus includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark 100 includes at least a first, a second and a third verification structures 110, 120 and 130 that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting. <P>COPYRIGHT: (C)2010,JPO&INPIT |
