| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a multi-tone photomask which allows a resist pattern having a desired residual film value to be always stably obtained even for a pattern having a narrow width, and a pattern transfer method using the same. <P>SOLUTION: A multi-tone photomask includes a transfer pattern which has a light-transmissive area, a light shielding area, and a light-semitransmissive area by a light shielding film 23 for intercepting exposure light and a semi-transmissive film 22 partially transmitting the exposure light, on a transparent substrate 21. When exposure light which has passed the multi-tone photomask and has an intensity ratio of g rays, h rays, and i rays of 1:1:1 is received by an optical system having a numerical aperture of 0.08 and a coherency of 0.8, a mask in-plane distribution range of an effective transmittance in the light-semitransmissive area is≤2.0%. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
