NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

PURPOSE: A photoacid generator is provided to perform proper acid diffusion control, to ensure excellent compatibility with resist materials, and to solve dense dependability and exposure latitude. CONSTITUTION: A photoacid generator generates sulfonic acids of formula (1a): R1-COOCH2CF2SO3-H+ or (1b): R1-O-COOCH2CF2SO3-H+ upon exposure to high-energy radiation. In formulae, R1 is a monovalent C20-C50 hydrocarbon group of steroid structure which may contain a heteroatom. The bulky steroid structure ensures adequate control of acid diffusion. The photoacid generators are compatible with resins and suited for use in chemically amplified resist compositions.