| 摘要 |
PROBLEM TO BE SOLVED: To obtain a plotter which is short in pattern forming time and high in cell positioning precision and can accurately plot oblique line graphics. SOLUTION: The plotter is provided with a light source 5 which emits a light beam, a scanner 2 which scans the light beam, and a condenser lens 3 provided between a substrate 4 irradiated with the light beam and the scanner and irradiates the substrate 4 with the light beam by scanning of the scanner to plot a pattern of a prescribed character, graphics, a symbol, or the like, and a DMD(digital micro mirror device) 1 which is provided between the light source and the scanner and consists of plural independently inclined micro mirrors, a picture switching means which switches pictures reflected from the DMD, and a picture moving means which moves pictures from the DMD are provided. |
