APPARATUS AND METHOD FOR MEASURING STATE

摘要

PURPOSE: A state detecting system and a detecting method thereof are provided to control the cost and to detect a state of a film on a substrate. CONSTITUTION: A state detecting system comprises a light source(2), an irradiation unit(6), a photo diode(10), a polarization control unit(8), a detection unit(14) and an operation unit(16). The light source gives monochromatic light. The irradiation unit irradiates the light from the light source to a substrate. The photo diode receives the light penetrating the substrate and is arranged on an optical axis of the light irradiated from the irradiation unit. The polarization control unit controls the s-polarized component irradiated to the substrate and is arranged in an optical path from the light source to the substrate. The detection unit detects the intensity of the light light-received with the photo diode. The operation unit produces a state value of the film on the top of the substrate based on the intensity detected from the detection unit.