OPTICAL SCANNING MIRROR, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING THE SAME

摘要

A semiconductor structure provided with an insulation/isolation structure in a movable portion is fabricated easily. An optical scanning mirror (semiconductor structure) (1) is formed by machining an SOI substrate (100) consisting of a first silicon layer (100a), an oxide film (120), and a second silicon layer (100b). A movable portion (50) supported on a fixed frame (4) through a first hinge (5) is formed on the first silicon layer (100a). The movable portion (50) is divided into a plurality of parts by forming a trench (insulation/isolation structure) (101a). A support (9) consisting of the oxide film (120) and the second silicon layer (100b) is formed below the trench (101a). A plurality of parts of a movable frame (3) divided by the trench (101a) are bonded to the support (9), and the movable portion (50) can oscillate integrally with the support (9). Consequently, mechanical strength of the movable portion (50) can be ensured by forming the support (9) through a fabrication process employing simple etching.