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发明名称
PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM
摘要
申请公布号
EP2002458(B1)
申请公布日期
2009.11.04
申请号
EP20070710522
申请日期
2007.03.16
申请人
IMS NANOFABRICATION AG
发明人
PLATZGUMMER, ELMAR
分类号
H01J37/04;H01J37/317
主分类号
H01J37/04
代理机构
代理人
主权项
地址
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