发明名称 Self-pulsation nitride semiconductor laser device and method for fabricating the same
摘要 In a buried type structure including an active layer sandwiched between an n-type cladding layer and a p-type cladding layer and a current blocking layer having an opening for confining a current flowing to the active layer, a regrown layer made of a nitride semiconductor doped with a p-type impurity is formed on the current blocking layer so as to cover the opening of the current blocking layer, and a portion of the regrown layer buried in the opening disposed to be adjacent to a side face of the opening and having a given width W is changed to have the n-type conductivity. Accordingly, the opening of the current blocking layer is effectively narrowed, so as to realize a self-pulsation nitride semiconductor laser device.
申请公布号 US7613218(B2) 申请公布日期 2009.11.03
申请号 US20060637739 申请日期 2006.12.13
申请人 PANASONIC CORPORATION 发明人 TAMURA SATOSHI;IKEDO NORIO
分类号 H01S5/00 主分类号 H01S5/00
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