发明名称 Layered structure for electron device including regions of different wettability, electron device and electron device array that uses such a layered structure
摘要 A layered structure comprises a variable wettability layer including a material that changes a critical surface tension in response to energy provided thereto, the wettability changing layer including at least a high surface energy part of large critical surface tension and a low surface energy part of low critical surface tension, a conductive layer formed on the variable wettability layer at the high surface energy tension part, and a semiconductor layer formed on the variable wettability layer at the low surface energy part.
申请公布号 US7612455(B2) 申请公布日期 2009.11.03
申请号 US20040856878 申请日期 2004.06.01
申请人 RICOH COMPANY, LTD. 发明人 TANO TAKANORI;FUJIMURA KOH;TOMONO HIDENORI;KONDOH HITOSHI
分类号 G02F1/1368;H01L23/48;H01L21/28;H01L21/288;H01L21/336;H01L23/52;H01L29/40;H01L29/786;H01L51/05;H01L51/40 主分类号 G02F1/1368
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