| 摘要 |
An exposure apparatus includes an optical system generating light, a mask, a light-absorbing member and a substrate plate. The mask includes a mask body disposed at a path of the light, a first light transmission pattern formed in a first region of the mask body, and a second light transmission pattern formed in a second region of the mask body. The mask is transported in a first direction. The light-absorbing member is disposed between the optical system and the mask, and has a diffusive reflection preventing part formed at a side surface of the light-absorbing member. The substrate plate supports a substrate having a photoresist layer formed thereon. The substrate plate is transported along the first direction together with the mask, thereby preventing a diffusive reflection.
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