| 摘要 |
PURPOSE: A method for forming a micro-pattern is provided to improve the aperture ratio by reducing widths of a pixel electrode and a common electrode without the improvement of resolution in an exposure unit. CONSTITUTION: A photosensitive layer is formed at upper parts of the first and second metal layers(160,162). According as the photosensitive layer is exposed and developed, a plurality of photosensitive patterns(192,194,196) are formed with the first line width. A plurality of metal patterns having the second line width narrower than the first line width. The photosensitive patterns are removed from the metal patterns through a strip process. Among the metal patterns exposed through the strip process, the second metal layer is removed and the first metal layer placed at a lower part of the second metal layer is exposed. |
