| 摘要 |
PURPOSE: A film deposition device is provided to prevent contamination of vacuum oil in a diffusion pump, and to form a multi-layered thin film of high purity efficiently. CONSTITUTION: A film deposition device includes a chamber, a permanent magnet(114), a cold plate(118), and a metallic structure(117). The film deposition device further includes an internal cathode(112), a cooling tube(116), an insulating material(121), and a gas tube. A slit is formed on an outer side of the chamber. A gas injection hole and a cooling tube inlet are formed on the bottom of the chamber. The permanent magnet is positioned on the top of the chamber. The cooling plate is located on the bottom of the permanent magnet. The metal structure is equipped in a lower part of the cooling plate.
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