| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve exposure efficiency by suppressing the generation of ozone when a substrate is scanned with a laser beam of ultraviolet light. <P>SOLUTION: The substrate coated with photoresist is held by a chuck 10, and a laser beam irradiation apparatus 20 which emits the laser beam of ultraviolet light from a head section 21 is disposed over the substrate 1 held by the chuck 10. A firsts chamber (30) is provided over the substrate held by the chuck 10 to enclose the space between the head section 21 of the laser beam irradiation apparatus 20 and the substrate 1, and a second chamber (40) is provided around the first chamber (30). The first chamber (30) is filled with gas containing no oxygen, and the second chamber (40) is evacuated. The substrate 1 held by the chuck 10 is scanned with the laser beam by irradiating the substrate 1 from the head section 21 of the laser beam irradiation apparatus 20 with the laser beam of ultraviolet light while the chuck 10 and laser beam irradiation apparatus 20 are relatively moved. <P>COPYRIGHT: (C)2010,JPO&INPIT |
