发明名称 EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To prevent misoperation of an exposure apparatus by improving exposure position precision of the exposure apparatus. <P>SOLUTION: The exposure apparatus includes: an imaging means 5 which has a plurality of photodetectors arranged linearly in a direction substantially orthogonal to the conveying direction of a color filter substrate 7 and which images an alignment mark 17 which is provided nearby an exposure start position on a surface of the color filter substrate 7 and outside an exposure area and comprises a plurality of thin lines orthogonal to one another; and a control means which processes image data imaged by the imaging means 5 and recognizes thin line substantially parallel to the arrangement direction of the plurality of photodetectors among the plurality of thin lines orthogonal to one another as a reference position in the conveying direction of the color filter substrate 7, and determines a position across a preset distance away from the recognized reference position as the exposure start position to control the timing of irradiation of the color filter substrate 7 with exposure light. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009251290(A) 申请公布日期 2009.10.29
申请号 JP20080099392 申请日期 2008.04.07
申请人 V TECHNOLOGY CO LTD 发明人 IWAMOTO MASAMI
分类号 G03F9/00 主分类号 G03F9/00
代理机构 代理人
主权项
地址