发明名称 |
APPARATUS AND METHOD FOR PROVIDING A CONFINED LIQUID FOR IMMERSION LITHOGRAPHY |
摘要 |
A METHOD FOR PROCESSING A SUBSTRATE IS PROVIDED WHICH INCLUDES GENERATING A MENISCUS (112) ON THE SURFACE OF THE SUBSTRATE (108) AND APPLYING PHOTOLITHOGRAPHY LIGHT THROUGH THE MENISCUS (112) TO ENABLE PHOTOLITHOGRAPHY PROCESSING OF A SURFACE OF THE SUBSTRATE (108). |
申请公布号 |
MY139592(A) |
申请公布日期 |
2009.10.30 |
申请号 |
MY2004PI02487 |
申请日期 |
2004.06.24 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
DAVID HEMKER;FRED C. REDEKER;JOHN BOYD;JOHN M. DE LARIOS;MICHAEL RAVKIN;MIKHAIL KOROLIK |
分类号 |
B08B3/10;G03F7/20 |
主分类号 |
B08B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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