| 摘要 |
<p>PURPOSE: A cleaning method of a photo mask is provided to easily remove a residual adhesive by selectively exposing a bonding part after separating a pellicle from a mask substrate. CONSTITUTION: A cleaning method of a photo mask comprises the following steps; a step for separating a pellicle from a photo mask; a step for masking the other region after a pellicle bonding part among the photo mask is exposed; a step for irradiating a fixed light ray on the exposed pellicle bonding part; and a step for removing a residual adhesive(120) by cleaning the photo mask through a cleaning solution in which a chemical is not included.</p> |
