| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce crystal defects in compound films. Ž<P>SOLUTION: Disclosed is a thin film forming device for successively depositing compound films by a plurality of thin film forming systems. The thin film forming device comprises: two first targets 4A, 4B opposite to each other; a high density radial source 5 facing an opposed space 10 between the first targets 4A, 4B from a direction almost vertical to the confronted direction of the first targets 4A, 4B; and a base material holder 6 facing the opposed space 10 between the first targets 4A, 4B from a direction different from the high density radical source 5. The back faces of the respective first targets 4A, 4B are provided with magnets 7 generating magnetic fields in the opposed direction of the first targets 4A, 4B, and, in the first thin film forming system, a negative voltage or an AC voltage is applied to each first target so as to form a compound film on a base material 8 to be installed in the base material holder 6. In this way, an initial layer can be formed by the first thin film forming system, and crystal defects in the compound film can be reduced. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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