发明名称 SUBSTRATE WITH SILICON COMPOUND FILM CONTAINING HOLLOW SILICONE-BASED FINE PARTICLES AT HIGH CONCENTRATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate with a film which contains hollow silicone-based fine particles and a hydrolyzable silicon compound, is obtained by reacting and curing them, and has high transparency, high anti-reflection performance, and high film strength. Ž<P>SOLUTION: The substrate with the film has a film containing 85-99 wt.% hollow core-shell fine particles obtained by producing core-shell particles by coating particles composed of organic polymer particles or an organic solvent with a silicone-based compound and thereafter removing the core component from the core-shell particles and containing 1-15 wt.% silica matrix. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009249493(A) 申请公布日期 2009.10.29
申请号 JP20080098999 申请日期 2008.04.07
申请人 KANEKA CORP 发明人 MUKAI RYUTARO;TAKAGI AKIRA
分类号 C08J7/04 主分类号 C08J7/04
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