发明名称 METHOD FOR MEASURING THICKNESS OF MULTILAYER THIN FILM
摘要 PROBLEM TO BE SOLVED: To measure the thickness of a thin film of each layer of a multilayer thin film in a short time. SOLUTION: This film thickness measuring method includes; a first step of having, as reference data, data on an optical reflection coefficient to incidence of long-wavelength light for passing through each-layer thin film having a known film thickness, and data on an optical reflection coefficient to incidence of short-wavelength light for passing through an upper-layer side thin film having a known film thickness, and having a smaller light transmittance to a lower-layer side thin film having a known film thickness as compared to the long-wavelength light; a second step of acquiring measurement data on an optical reflection coefficient to incidence of the long-wavelength light upon each thin film to be an object of film thickness measurement as measurement data on the long-wavelength light, and measurement data on an optical reflection coefficient to incidence of the short-wavelength light upon the upper-layer side thin film as measurement data on the short-wavelength light; and a third step of calculating the thickness of each-layer thin film by comparing the optical measurement data with the reference data in the long-wavelength light, and comparing the measurement data with the reference data in the short-wavelength light. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009250783(A) 申请公布日期 2009.10.29
申请号 JP20080098969 申请日期 2008.04.07
申请人 SONAC KK 发明人 KOMUKAI TAKUJI
分类号 G01B11/06 主分类号 G01B11/06
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