| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a visual examination device capable of certainly recognizing an alignment mark even if a pattern having low contrast is indicated as the alignment mark. Ž<P>SOLUTION: The visual examination device includes an imaging part for imaging a semiconductor wafer and an operational processing means for preparing the registered image data of an image registering alignment mark indicating the image data of a pattern, which has the pattern area A1 in the inspection region of the semiconductor wafer imaged in the imaging part and a pattern area B having gradation higher than that of the pattern area A1, as the alignment mark, converting the gradation of the pattern area A1 to higher gradation in the alignment mark and setting the pattern area B to the same gradation. The sum total area of the pattern area A1 and the pattern area B is 50% or above of the whole area of the alignment mark and the area ratio of the pattern area A1 to the sum total area of the pattern area A1 and the pattern area B is 20-80%. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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