发明名称 MEASUREMENT METHOD AND EXPOSURE APPARATUS
摘要 A method of measuring an optical characteristic of an optical system using a measurement apparatus, comprises determining a position of each of object points by arranging, on a side of the object plane, an object point measurement device array, and sequentially inserting the object point measurement devices in an optical path, determining a position of each of image points by arranging, on a side of the image plane, an image point measurement device array, and sequentially inserting the image point measurement devices in the optical path, calculating an error attributed to the measurement apparatus based on the positions of object points and the positions of the image points, obtaining a measured value by measurement to obtain information representing the optical characteristic of the optical system using the measurement apparatus, and correcting the measured value based on the error.
申请公布号 US2009268181(A1) 申请公布日期 2009.10.29
申请号 US20090419931 申请日期 2009.04.07
申请人 CANON KABUSHIKI KAISHA 发明人 TEZUKA TARO;KURAMOTO YOSHIYUKI
分类号 G03B27/42;G01B11/02;G03B27/54 主分类号 G03B27/42
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