| 发明名称 |
SHOWERHEAD FOR CHEMICAL VAPOR DEPOSITION AND CHEMICAL VAPOR DEPOSITION APPARATUS HAVING THE SAME |
| 摘要 |
A showerhead for chemical vapor deposition (CVD) includes a head storing reaction gas flowing thereinto and feeding the stored reaction gas to a reaction chamber, and at least one support member passing through and coupled with the head and the reaction chamber so as to support the head.
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| 申请公布号 |
US2009266911(A1) |
申请公布日期 |
2009.10.29 |
| 申请号 |
US20080248367 |
申请日期 |
2008.10.09 |
| 申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
KIM CHANGSUNG SEAN;HONG JONG PA;LEE KYUNG HO |
| 分类号 |
B05B1/14 |
主分类号 |
B05B1/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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