| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method for a photosensitive substance, which improves patterning precision. <P>SOLUTION: In the exposure method, a photosensitive resin 2 provided on an upper surface of a substrate 1 is irradiated with light through a mask member disposed above the photosensitive resin 2 to form a specified exposure pattern comprising an exposed part and an unexposed part on the photosensitive resin 2. Then a light absorber 4A, which absorbs light, is provided facing the part of the photosensitive resin 2 as an unexposed part, and the photosensitive resin 2 is irradiated with the light in this state. <P>COPYRIGHT: (C)2010,JPO&INPIT |
