| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve accuracy of position measurement of a stage in a lithographic apparatus. <P>SOLUTION: A stage system includes a movable stage, at least two encoder heads each of which supplies an encoder signal representing a position of the movable stage relative to an encoder target structure, and a controller, for controlling the position of the stage, to which the encoder signals from each of the encoder head is supplied, wherein the controller applies weighting function to the encoder signals and determines the position of the stage from the weighted encoder signals. <P>COPYRIGHT: (C)2010,JPO&INPIT |
