发明名称 PASSGATE STRUCTURES FOR USE IN LOW-VOLTAGE APPLICATIONS
摘要 Enhanced passgate structures for use in low-voltage systems are presented in which the influence of Vt on the range of signals passed by single-transistor passgates is reduced. In one arrangement, the VGATE-Vt limit for signals propagated through NMOS passgates is raised by applying a higher VGATE; in another arrangement, the Vt is lowered. The use of CMOS passgates in applications where single-transistor passgates have traditionally been used is also presented.
申请公布号 US2009267645(A1) 申请公布日期 2009.10.29
申请号 US20090484665 申请日期 2009.06.15
申请人 ALTERA CORPORATION 发明人 LEE ANDY L.;CHANG WANLI;MCCLINTOCK CAMERON;TURNER JOHN E.;JOHNSON BRIAN D.;HWANG CHIAO KAI;CHANG RICHARD YEN-HSIANG;CLIFF RICHARD G.
分类号 H03K19/177;H03K17/06 主分类号 H03K19/177
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