Projection lens for use in projection exposure system, has manipulator with aberration component that is adjusted such that it corrects defect in addition with other aberration component, while latter component corrects image defect

摘要

The lens has an optical arrangement (26) with a manipulator (38) for correction of aberrations in an image field in an image plane (22) and optically arranged next to a pupil plane (P). Another manipulator (40) induces a wave front aberration including a component. The component of the wave front aberration is adjusted such that it corrects an image defect, which is constant over the image field, in addition with other component of other wave front aberration, while the latter component corrects the image defect that is variable over the image field. An independent claim is also included for a method for improving image characteristics of a projection lens for microlithography.