发明名称 POSITION CONTROL SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR CONTROLLING A POSITION OF A MOVABLE OBJECT
摘要 <p>PURPOSE: A position control system, a lithography device, and a method for controlling a position of a movable object are provided to improve a reaction time and accuracy of a position control system. CONSTITUTION: A position control system controls a position of a movable object, and includes a comparator, a controller, a feed-forward device(FF), an actuator, and a compliance compensator. The comparator provides an error signal. The controller provides a control signal based on the error signal. The feed-forward device provides a feed-forward signal based on a first signal related to a desired position. The actuator is operated on the movable object based on the control signal and the feed-forward signal. The compliance compensator provides a compliance compensation signal.</p>
申请公布号 KR20090113225(A) 申请公布日期 2009.10.29
申请号 KR20090036252 申请日期 2009.04.24
申请人 发明人
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
代理机构 代理人
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