发明名称 NITRIDE BASED SEMICONDUCTOR DEVICE USING NANORODS AND PROCESS FOR PREPARING THE SAME
摘要 Disclosed are a nitride based semiconductor device, including a high-quality GaN layer formed on a silicone substrate, and a process for preparing the same. A nitride based semiconductor device in accordance with the present invention comprises a plurality of nanorods aligned and formed on the silicone substrate in the vertical direction; an amorphous matrix layer filling spaces between nanorods so as to protrude some upper portion of the nanorods; and a GaN layer formed on the matrix layer.
申请公布号 US2009269909(A1) 申请公布日期 2009.10.29
申请号 US20090497060 申请日期 2009.07.02
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KIM MIN HO;KOIKE MASAYOSHI;MIN KYEONG IK;LEE SEONG SUK;JANG SUNG HWAN
分类号 H01L21/20;H01L33/12;H01L33/16;H01L33/32;H01L33/34 主分类号 H01L21/20
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