| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve highly precise position measurement and driving control with respect to a wafer table. <P>SOLUTION: Measurement light beams Lx1 and Ly2 are made incident on a grating provided on an upper surface of the table WTB through one side face thereof from light sources 16Xa and 16Ya constituting an encoder system, and optical detectors 16Xb and 16Yb receive diffracted light beams Lx2 and Ly2 originating from those measurement light beams to measure position information on the table WTB. Consequently, an influence of fluctuations of a peripheral atmosphere of the table WTB is small, so the position of the table WTB is measured with high precision. Further, the table WTB is driven based upon the position information on the table WTB obtained using the encoder system and correction information on a measurement error due to a tilt of the table included in the position information. The position information is corrected using the correction information, and the table WTB is driven with high precision based upon the corrected position information. <P>COPYRIGHT: (C)2010,JPO&INPIT |
