| 摘要 |
By irradiating a first substrate which is an evaporation donor substrate including a function layer in which films having different refractive indexes (high-refractive index films and low refractive index films) are stacked with first light (wavelength=lambda1), a material layer over the first substrate is patterned, and by irradiating the first substrate with second light (wavelength=lambda2) which is different from lambda1, the material layer which is patterned is evaporated onto a second substrate which is a deposition target substrate.
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